Chip manufacturing has made a new breakthrough with silicon photonics, where the cost is only 1/10 of DUV.

On June 5th, Purui Technology announced that the company has achieved a breakthrough in the mass production of 8-inch optical chips using a vacuum pressure nanoimprint solution in cooperation with Shenzhen Lice Technology. Relying on Purui Technology's independently developed PL-AS vacuum pressure wafer-level nanoimprint lithography equipment, together with customized dual-layer imprinting materials and core processes, completely bypassing the deep ultraviolet lithography route, successfully achieving scalable mass production of 8-inch optical chip wafers, and reducing chip manufacturing costs to one-tenth of traditional DUV schemes. In the A-share market, companies related to nanoimprint lithography include Sudawei, Medikai, Lihe Xing, Jingfang Technology, Jinghua Laser, Crystal Optoelectronics, etc.