Delivery of the first advanced lithography photoresist curing equipment Ultra Lith BK order in Shanghai Brilliance.

On November 19, Shengmei Shanghai announced the delivery of the first order of advanced lithography photoresist curing equipment, Ultra Lith BK, from a leading global display screen manufacturer. The equipment is designed to address issues such as uniformity, temperature drift, and critical size variation in advanced lithography processes, helping manufacturers maintain stable yields and graphic fidelity as device sizes continue to shrink. The equipment can achieve highly stable and repeatable lithography processes.