Hong Kong Stock Concept Tracker | Major Breakthrough! Landau Suiyan EUV Light Source Prototype Debuts at the Industrial Expo, Localization Rate Reaches 90% (with Concept Stocks)

date
06:59 15/10/2026
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GMT Eight
Landau Suiyan publicly displayed an EUV light source system prototype for the first time. This is the most advanced domestically produced EUV light source prototype publicly demonstrated to date, and is referred to as the "heart" of high-end lithography machines.
According to reports, at the 26th China International Industry Fair, Landau Suiyan publicly displayed an EUV light source system prototype for the first time. This is the most advanced domestically produced EUV light source prototype publicly demonstrated to date, and is called the "heart" of high-end lithography machines. This marks a major breakthrough in the domestic EUV light source field, and a key step from the laboratory to industrialization has been taken. Extreme ultraviolet (EUV) light sources are one of the three core components for chip manufacturing at advanced processes of 7nm and below. They have long been subject to overseas technological monopoly and embargo restrictions, and are a key link constraining China's high-end chip self-controllability. According to the introduction, the localization rate of the light source system exhibited this time reached 90%, with the vast majority of core components independently developed, and the technical route is consistent with leading international manufacturers, and it can be used for chip exposure testing. However, it will still take 3 to 5 years for this light source system to reach mass production. The core challenges currently faced are increasing output power and long-term operating stability. Commercial EUV lithography systems require light source power to reach the hundreds-of-watts level and to maintain high reliability during long-term operation. Taking ASML as an example, since the launch of its 250W version in 2018, its EUV light source system has achieved mass production application and is currently evolving toward a higher 1000W power level. According to the official website, Landau Suiyan's low-power EUV light source system FlintNano LPP-OXXO has already entered the productization stage, with a drive laser power of 1000W, a laser frequency of 1 to 20kHz, conversion efficiency greater than 2%, EUV energy greater than 15W, continuous operating time exceeding 100 hours, and a plasma size of 60 micrometers. The high-power extreme ultraviolet light source system FlintMicro-LPP series has completed proof of principle. Analysts believe that the prototype displayed by Landau Suiyan at the Industry Fair currently verifies the feasibility of the technical route, but there is still an obvious gap from the product maturity required for industrial-grade applications. From an EUV energy output at the 15W level to the mass production requirement of hundreds of watts, what Landau Suiyan needs to overcome is not only a multiple-fold increase in power, but also comprehensive breakthroughs in plasma stability, light source lifespan, and system integration reliability. Guosheng believes that for domestic lithography machines, domestic demand exceeds domestic supply, and high-end lithography machines are still in the R&D stage and have not yet achieved large-scale mass production. As geopolitical risks continue to tighten, the substitution space in the domestic lithography machine industry chain is broad. Related concept stocks: Semiconductor Manufacturing International Corporation (00981): In the first half of 2026, the company achieved revenue of 38.635 billion yuan, a year-on-year increase of 19.44%; net profit attributable to shareholders was 4.467 billion yuan, a year-on-year surge of 94.16%, among which Q2 single-quarter net profit increased by 128% quarter-on-quarter. The company's Q3 guidance is revenue growth of 2% to 4% quarter-on-quarter, with a gross margin of 26% to 28%. Hua Hong Grace Semiconductor (01347): In the first half of 2026, Hua Hong Grace Semiconductor achieved operating revenue of 9.574 billion yuan, a year-on-year increase of 19.41%. Net profit attributable to shareholders of the listed company was nearly 399 million yuan, a year-on-year increase of 436.69%; the impact of non-recurring gains and losses on net profit was 82.9226 million yuan; net profit attributable to shareholders of the listed company after deducting non-recurring gains and losses was nearly 316 million yuan, a year-on-year increase of 470.34%. SHANGHAI FUDAN (01385): In the first half of 2026, the company achieved total operating revenue of 2.225 billion yuan, a year-on-year increase of 21.03%; net profit attributable to shareholders of the listed company was 849 million yuan, a sharp year-on-year increase of 338.58%, an increase of more than threefold; net profit after deducting non-recurring gains and losses was 412 million yuan, a year-on-year increase of 125.88%.